铝表面无机非金属膜层的阳极沉积  

Anodic Deposition of Inorganic Non Metal Film on Al Surface

作　　者：侯朝辉[1] 旷亚非[1] 刘建平[1] 

机构地区：[1]湖南大学化学化工学院,长沙410082

出　　处：《电镀与环保》2000年第3期32-34,共3页Electroplating & Pollution Control

摘　　要：对铝在Na2 WO4 H3PO4溶液中的阳极极化行为进行了研究。结果表明 ,在高电压、大电流的作用下 ,铝表面可沉积一层致密的无机非金属膜层。该膜层与基底金属结合牢固 ,具有较高的硬度、耐磨和耐蚀性能。采用电化学方法进行无机非金属膜层沉积的表面处理方法 ,工艺简单、成膜速度快 ,具有很好的工业应用前景。Anodizing behavior of Al in Na 2WO 4 H 3PO 4 soln was investigated. Results show, at effects of high voltage and large current, on Al surface could be deposited inorganic non metal dense film with comparatively high hardness, abrasion and corrosin resistance, and firm adhesion with substrate. The surface treatment method of electrochemical deposition of inorganic non metal film features simple process and rapid film forming and, therefore, has good future of industrial application.

关 键 词：铝 阳极沉积 无机非金属膜层 阳极氧化 电镀 

分 类 号：TQ153.6[化学工程—电化学工业]