亚微米深度位相型衍射光栅的研制及其失效分析  

Development and Failure Analysis of Phase Diffraction Grating with Sub-micron Depth

作　　者：田红彦[1] 齐欣平 龚勇清[1] 周张钰[1] 苏兆国[1] 

机构地区：[1]无损检测技术教育部重点实验室(南昌航空大学),南昌330063 [2]吉林省特种设备监督检验中心,长春130041

出　　处：《失效分析与预防》2012年第2期99-103,共5页Failure Analysis and Prevention

基　　金：国家自然科学基金(61072131)

摘　　要：提出了一种亚微米深度的纯位相型玻璃衍射光栅制作工艺,采用光刻制栅方法对要制作的光栅结构进行了分析;用AUTOCAD绘图软件绘制光栅的排列布局以及MATLAB软件对设计出的图案进行衍射图样模拟,在基于数字微镜的光刻机上进行曝光,由涂覆光刻胶的铬玻璃上得到缩微图案;观察了单色激光的夫琅禾费光栅衍射图样,以确定最终的设计图案;用电子束刻蚀方法得到的铬掩膜板进行常规光刻工艺处理,得到纯位相型的衍射光栅,最后通过对衍射光栅的衍射图案的失效性分析确定最佳的光刻工艺。结果表明:利用光刻制栅方法不仅可以在玻璃上制得纯位相型光栅,同样也可以在硅片、金属等其他基底上制得光栅或其他光学重复单元,方法可行,且材料成本不高。A manufacturing procedure for pure phase glass diffraction grating with sub-micron depth was put forward. The advanced process of photolithography was used to analyze the structure of the grating and the structure distribution was designed according to the desired diffraction pattern. The arranged layout of the grating was drawn with AUTOCAD and the diffraction pattern was simulated by MATLAB. Exposure was performed by using a photoetching machine based on digital the miniature image was acquired at the chromium glass coated with light-sensitive lacquer. The Fraunhofer diffraction pattern of a monocolor laser beam was observed and the final design was determined. The pure phase grating was gotten after the chromium membrane mask was treated by regular photoetching process. At last, the best photoetching process was determined through failure analysis on the pattern of diffraction grating. The results show that not only can the grating or optical reduplication units be acquired on glass, but also can be obtained on any other substrate such as silicon wafer and metal material. The photolithographic method for making the grating or optical reduplication units is feasible and cheap.

关 键 词：亚微米 位相型 衍射光栅 失效分析 

分 类 号：TH744.1[机械工程—光学工程]