镁合金表面制备硅掺杂类金刚石膜的性能研究  

Research on the properties of diamond-like carbon films prepared on magnesium alloy substrate

作　　者：李庆刚[1] 罗庆丽 王修春[1] 罗庆刚 

机构地区：[1]山东省科学院新材料研究所,山东济南250014 [2]山东省劳动职业技术学院基础部,山东济南250022 [3]济南安塞自动化技术有限公司,山东济南250022

出　　处：《山东科学》2012年第2期67-71,75,共6页Shandong Science

摘　　要：将无铬化学转化新工艺与射频等离子化学气相沉积(PECVD)技术相结合,先在镁合金表面生成一层多孔结构、附着力高的化学转化膜作为过渡层,再采用PECVD技术低温沉积一层硅掺杂类金刚石(Si-DLC)薄膜复合涂层。扫描电子显微镜和拉曼光谱图分析证实,获得的薄膜由sp2和sp3键杂化的碳硅氢化合物呈层状堆积而成,薄膜均匀、平整致密;制备的薄膜为典型的类金刚石结构。原子力显微镜直观地观察到,掺杂硅的类金刚石薄膜比未掺杂的平整致密。当硅含量达到20%时,得到的DLC薄膜最为平整致密,无铬化学转化膜层均被含硅的DLC薄膜覆盖。性能测试实验表明,将化学转化膜作为中间过渡层并采用PECVD沉积含硅的DLC薄膜明显提高了镁合金基体与其的结合强度,同时也大幅度提高了镁合金的耐磨、耐高温和耐蚀性。We employed the new technology of chromium-free chemical conversion surface treatment and plasma enhanced chemical vapor deposition （PECVD） to prepare diamond-like carbon （DLC） films by two steps. We initially formed a porous structure on Mg alloy substrate and took a high adhesion film as the transitional layer. We further employed PECVD technology to prepare DLC films with Si-DLC. Scanning electron microscope and Raman spectroscopy demonstrate that the films are uniform, smooth and compact, and composed of layered compounds of C, Si and H. The films also have the same characteristics as DLC. Observation through an atomic force microscope （AFM） shows that Si-DLC films are more compact than un-doping Si-DLC films. Si-DLC films are the most compact and completely cover the chemical conversion coating. Performance test shows that the intermediate layer between chemical conversion coating and Si-DLC film significantly improves the bond strength between Mg alloy substrate and DLC film. The intermediate layer also dramatically improves wear resistance, high temperature resistance and corrosion resistance capabilities of Mg alloy.

关 键 词：化学转化膜 射频等离子化学气相沉积 硅掺杂类金刚石 镁合金 

分 类 号：TB34[一般工业技术—材料科学与工程]