吸水剖面测井沾污控制与校正处理  

Contamination Control of Injection Profile Log and Its Correction.

作　　者：何茂东 覃远庆 

机构地区：[1]广西田东石油测录井分公司

出　　处：《测井技术》2000年第2期113-117,共5页Well Logging Technology

摘　　要：对吸水剖面测井中沾污形成的原因进行了分析 ,提出降低示踪剂的比强度和注入“冷球”两种控制吸水剖面测井沾污的新工艺。从理论上分析了如何对沾污进行校正 ,建立了沾污校正的解释模型。实际结果表明 ,对沾污进行校正后提高了吸水剖面测井的解释精度。Analyses the origin of contamination in injection profile logging; Puts forward a new technique to control the contamination by reducing specific strength of 131BaGTP microspherical tracer and injecting an amount of nonradioactive tracer; Discuses how to correct the contamination and sets up the injection profile interpretation model of contamination correction. Application result proves that such a correction can improve interpretation accuracy of injection profile log.

关 键 词：吸水剖面 污染防治 示踪剂 测井解释 校正处理 

分 类 号：P631.84[天文地球—地质矿产勘探]