Design and fabrication of a novel high damage threshold HfO_2/TiO_2/SiO_2 multilayer laser mirror  

作　　者：孟增铀 黄莎玲 刘哲 曾承航 卜轶坤 

机构地区：[1]Department of Electronic Engineering,Xiamen University

出　　处：《Optoelectronics Letters》2012年第3期190-192,共3页光电子快报（英文版）

基　　金：supported by the National Natural Science Foundation of China (No.50802080);the Natural Science Foundation of Fujian Province of China (No.2010J01349)

摘　　要：This paper describes a new method to design a laser mirror with high reflectivity, wide reflection bandwidth and high laser- induced damage threshold. The mirror is constructed by three materials of HfO/TiO2/SiO2 based on electric field and temperature field distribution characteristics of all-dielectric laser high reflector. TiO/SiO2 stacks act as the high reflector （HR） and broaden the reflection bandwidth, while HfO2/SiO2 stacks are used for increasing the laser resistance. The HfO/ TiO/SiO2 laser mirror with 34 layers is fabricated by a novel remote plasma sputtering deposition. The damage threshold of zero damage probability for the new mirror is up to 39.6 J/cm^2 （1064 nm, 12 ns）. The possible laser damage mechanism of the mirror is discussed.

关 键 词：BANDWIDTH Dielectric materials Electric fields Hafnium oxides REFLECTION Titanium dioxide 

分 类 号：TH74[机械工程—光学工程]