俄歇参数法及其在硅酸盐材料研究中的应用  

AUGER PARAMETER AND ITS APPLICATION IN SILICATE MATERIALS

作　　者：王典芬[1] 郑兆佳[1] 李道铭 

机构地区：[1]武汉工业大学材料研究与测试中心

出　　处：《硅酸盐学报》1989年第4期368-374,共7页Journal of The Chinese Ceramic Society

摘　　要：本文对Auger参数法及其在硅酸盐材料研究中的应用作了综合介绍。在VG ESCALAB MKII电子能谱仪上作了韧致辐射激发Si KLL的尝试。实验结果表明,普通配有Al/Mg双阳极的X射线光电子能谱仪可以获得SiKLL线;用Auger参数法可弥补XPS法在硅酸盐材料分析方面的不足,并为AP法在该材料领域中的应用指出了乐观的前景。The paper gives a comprehensive introduction to Auger parameter and its applications in silicate materials study. Experiments on SiKLL lines emitted by bremsstrahlung radiation from Al/Mg X-ray sources with Al window were made. All experimental data show that SiKLL lines is easily observed by means of a new ESCALAB MKII spectrometer with Al/Mg X-ray sources and Al window. The analysis of Auger parameter is a very good complementary method for XPS study of silicate materials and its applications to silicate materials will have a very good future.

关 键 词：俄歇参数法 硅酸盐 韧致辐射激发 

分 类 号：TQ170.12[化学工程—硅酸盐工业]