电弧离子镀沉积磁性薄膜的研究  

STUDY ON DEPOSITION OF MAGNETIC FILMS USING ARC ION PLATING

作　　者：常正凯[1] 肖金泉[1] 陈育秋[1] 刘山川[1] 宫骏[1] 孙超[1] 

机构地区：[1]中国科学院金属研究所,沈阳110016

出　　处：《金属学报》2012年第5期547-554,共8页Acta Metallurgica Sinica

基　　金：国家自然科学基金资助项目51171197~~

摘　　要：研究了电弧离子镀磁性靶材使用过程中发生"跑弧"并导致靶材无法稳定刻蚀的问题.利用有限元方法(FEM)对外加磁场下非磁性靶材系统和磁性靶材系统中的磁场分布进行了模拟.研究了外磁场对电弧斑点运动的影响机理,并结合电弧斑点放电的物理机制,探讨了磁性靶材与低饱和蒸气压金属靶壳、绝缘陶瓷靶壳或软磁性金属靶壳组成复合结构靶材解决磁性靶材使用问题的可行性.结果表明,这3种复合结构靶材设计方案均能有效解决电弧离子镀磁性靶材"跑弧"问题.通过实验得到,在低饱和蒸气压金属或绝缘陶瓷靶壳设计方案里,靶材频繁引弧到弧斑能受控运动的转变温度为(136.6±23.0)℃.Arc ion plating（AIP） has been widely used for depositing various kinds of coatings due to the excellent characteristics of high deposition rate,convenient parameter control,high degree of ionization in the target material,good coating-substrate adhesion,flexibility of target arrangements and merits of producing coatings with high packing density.Magnetic films,with a few micrometers or less,could be utilized in the electronics industry,such as magnetic recording,magnetic microelectromechanical systems,magneto optical modulator,and so on.In AIP process,due to magnetic shielding and self-induced magnetic field,arc spot on the surface of the magnetic target moved outside all the time,and the erosion of the magnetic target could not be stable.In this study,arc spot outside moving and unstable erosion of the magnetic target in arc ion plating have been investigated.The distribution of the magnetic field of the nonmagnetic target and the magnetic target under an additional magnetic field was simulated by the finite element method（FEM）.The effect of magnetic field on the arc spot movement was researched.With the physical mechanism of the arc spot discharge,the feasibility on the solution of the application problem of the magnetic target has been discussed by the program of the composited structure target,which were composed of magnetic target materials and target shell of low saturation vapor pressure metal,target shell of insulating ceramics,or target shell of soft magnetic metal.The results showed that all these solutions could solve the problem of arc spot outside moving efficiently.In the study,the transition temperature is（136.6±23.0）℃in the solutions of the target shell of low saturation vapor pressure metal or insulating ceramics,during which the arc striking frequently transformed to the controlled movement of arc spot.

关 键 词：电弧离子镀 磁性材料 有限元方法 磁场分布 复合结构靶材 

分 类 号：TG174.4[金属学及工艺—金属表面处理]