NiCu/Cu多层纳米线微、纳结构及成份研究  

Nanostructure and chemical characterization of NiCu/Cu multilayer nanowires

作　　者：齐阔[1] 马传生[1] 李兴华[1] 张宏[1] 薛德胜[1] 王丽[1] 彭勇[1] 

机构地区：[1]兰州大学物理科学与技术学院磁学与磁性材料教育部重点实验室,甘肃兰州730000

出　　处：《电子显微学报》2012年第2期97-103,共7页Journal of Chinese Electron Microscopy Society

基　　金：国家自然科学基金资助项目(No.11034004);国家重大科学研究计划资助项目(No.2012CB93310X);甘肃省自然科学基金资助项目(1107RJZA221);中央高校基本科研业务研究费资助(860521)

摘　　要：采用双脉冲电化学沉积法,以多孔阳极氧化铝(AAO)为模板制备了NiCu/Cu多层纳米线。利用透射电子显微术研究其微/纳结构和成分。研究结果表明,单根NiCu/Cu纳米线尺寸均匀,平均直径为53 nm,系多晶面心立方(fcc)结构。STEM模式下EDS线扫描和EDS面分布显示多层纳米线呈现NiCu和Cu交替排列组成的多层结构,其NiCu层和Cu层的平均沉积速率分别为5 nm/s和2 nm/s。化学组分测量测定NiCu层原子比为Ni∶Cu=51∶49,Cu层为纯铜。并通过NiCu合金和Cu纳米线元素测定分析、验证了Ni和Cu的含量比例关系。利用HRTEM和CBED深入表征分析了非磁性层尺度小于10 nm的NiCu/Cu纳米线的磁性层、非磁性层和过渡层结构。NiCu/Cu multilayer nanowires have been successfully fabricated by a pulse electrodeposition technique into the channels of nanoporous anodic aluminum oxide（AAO） templates,and their morphology,chemistry and crystal structure have been characterized at the nanoscale.It is found that individual multilayer nanowires have a regular periodic structure like bamboo.The average diameter of NiCu/Cu multilayer nanowires was approximately 53 nm.EDS line scan and EDS elemental mappings revealed that individual multilayer nanowires contained an alternating NiCu and Cu layers,and the growth rate was approximately 5 nm/s for NiCu layer and 2 nm/s for Cu.The chemical composition of multilayer nanowires was measured to be（Ni51Cu49/Cu）n.HRTEM,SAED and CBED results indicated that Ni51Cu49/Cu multilayer nanowires were polycrystalline face centered cubic lattice structure.

关 键 词：多层纳米线 扫描透射电子显微学 EDS面分析 会聚束电子衍射(CBED) 电化学沉积 微/纳结构 

分 类 号：TB383.1[一般工业技术—材料科学与工程]