GD-MS法和ICP-MS法测定高纯铌中痕量元素  

Determination of trace amounts of elements in high purity niobium by GD-MS and ICP-MS

作　　者：李宝城[1] 刘英[1] 童坚[1] 李继东[1] 李艳芬[1] 臧慕文[1] 

机构地区：[1]北京有色金属研究总院分析测试技术研究所,北京100088

出　　处：《分析试验室》2012年第6期39-42,共4页Chinese Journal of Analysis Laboratory

基　　金：国家科技支撑计划项目(2006BAF07B02)资助

摘　　要：采用辉光放电质谱法(GD-MS)对高纯铌中Ta,Mo,W等痕量杂质元素进行了测试,并对GD-MS工作参数进行了优化,部分元素与采用电感耦合等离子体质谱法(ICP-MS)定量分析的结果进行比较,对某些元素含量差别较大的原因进行了分析,论述了Element GD辉光放电质谱仪的特点及其在痕量杂质分析上的优势。Elements such as Ta,Mo,W in high-purity niobium were determined by glow discharge mass spectrometry（GD-MS）.The operating parameters and conditions of GD-MS were optimized and selected.Results of a partion of elements determined by GD-MS were compared with those analyzed by inductive coupled plasma mass spectrometry（ICP-MS）.The characteristics and advantages of trace element analysis by element GD-MS were discussed.

关 键 词：高纯铌 辉光放电质谱法 电感耦合等离子体质谱法 痕量元素分析 

分 类 号：O657.63[理学—分析化学]