Fabrication technique of micro/nano-scale speckle patterns with focused ion beam  

作　　者：LI YanJie XIE HuiMin LUO Qiang GU ChangZhi HU ZhenXing CHEN PengWan ZHANG QingMing 

机构地区：[1]AML,Department of Engineering Mechanics,Tsinghua University,Beijing 100084,China [2]Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China [3]State Key Laboratory of Explosion Science and Technology,Beijing Institute of Technology,Beijing 100081,China

出　　处：《Science China(Physics,Mechanics & Astronomy)》2012年第6期1037-1044,共8页中国科学：物理学、力学、天文学（英文版）

基　　金：supported by the National Basic Research Program of China (Grant Nos.2010CB631005 and 2011CB606105);the National Natural Science Foundation of China (Grant Nos.90916010 and 11172151);the Specialized Research Fund for the Doctoral Program of Higher Education (Grant No. 20090002110048)

摘　　要：The fabrication technique of micro/nano-scale speckle patterns with focused ion beam (FIB) system is studied for digital image correlation (DIC) measurement under a scanning electron microscope (SEM).The speckle patterns are fabricated by directly etching the counterpart of the specimen to the black part of a template.Mean intensity gradient is used to evaluate the quality of these SEM images of speckle patterns fabricated based on different templates to select an optimum template.The pattern size depending on the displacement measurement sensitivity is adjusted by altering the magnification of FIB according to the relation curve of the etching size versus magnification.The influencing factors including etching time and ion beam current are discussed.Rigid body translation tests and rotation tests are carried out under SEM to verify the reliability of the fabricated speckle patterns.The calculated values are in good agreement with the imposed ones.The fabrication technique of micro/nano-scale speckle patterns with focused ion beam （FIB） system is studied for digital image correlation （DIC） measurement under a scanning electron microscope （SEM）.The speckle patterns are fabricated by directly etching the counterpart of the specimen to the black part of a template.Mean intensity gradient is used to evaluate the quality of these SEM images of speckle patterns fabricated based on different templates to select an optimum template.The pattern size depending on the displacement measurement sensitivity is adjusted by altering the magnification of FIB according to the relation curve of the etching size versus magnification.The influencing factors including etching time and ion beam current are discussed.Rigid body translation tests and rotation tests are carried out under SEM to verify the reliability of the fabricated speckle patterns.The calculated values are in good agreement with the imposed ones.

关 键 词：speckle pattern digital image correlation （DIC） micro/nano-scale focused ion beam （FIB） scanning electron microscope （SEM） 

分 类 号：TN305.7[电子电信—物理电子学] TB383[一般工业技术—材料科学与工程]