非晶/纳米晶TiB_2薄膜的制备及其电化学性能研究  

Preparation and Corrosion Resistance of TiB_2 Amorphous-Nanocrystalline Films

作　　者：潘小静[1] 沈凯[1] 徐江[1] 刘林林[1] 

机构地区：[1]南京航空航天大学材料科学与技术学院,南京210016

出　　处：《电子器件》2012年第2期135-138,共4页Chinese Journal of Electron Devices

基　　金：江苏省自然基金项目(BK2010073)

摘　　要：通过双层辉光离子渗表面处理技术,在纯Ti基体上制备了非晶/纳米晶TiB2及Ti(Al)B2薄膜。利用X射线衍射(XRD)和透射电子显微镜(TEM)观察薄膜的微观组织特征。运用动电位极化及交流阻抗谱(EIS)的电化学方法,研究薄膜试样在3.5 wt.%NaCl溶液中的电化学特性。结果表明:制备的薄膜试样大大提高了纯Ti基体耐蚀性能,Al元素的加入稍微降低了薄膜的耐蚀性,但仍优于基体材料。The amorphous-nanocrystalline TiB2 and Ti（Al）B2 films were prepared on pure Ti substrate by double glow discharge plasma technique.The microstructures of films were studied by X-ray diffractrometry and transmission electron microscopy（TEM）.The corrosion behaviour of films had been characterised by potentiodynamic polarization and electrochemical impedance spectroscopy（EIS）in 3.5 wt.% NaCl solution.The results revealed that the corrosion resistance of the amorphous-nanocrystalline TiB2 films was improved.Corrosion resistance of film can be decreased by adding Al element,but still better than the substrate.

关 键 词：非晶/纳米晶 耐蚀性能 动电位极化 交流阻抗谱 

分 类 号：O484.1[理学—固体物理]