N_2分压对(Ti,Al)N涂层成分、结构及力学性能的影响  

Effects of N_2 Partial Pressure on Composition,Structure and Mechanical Properties of(Ti,Al)N

作　　者：赵升升[1] 

机构地区：[1]深圳职业技术学院机电工程学院,广东深圳518055

出　　处：《深圳职业技术学院学报》2012年第3期51-54,共4页Journal of Shenzhen Polytechnic

基　　金：广东省自然科学基金资助项目(No.S2011040004468)

摘　　要：采用电弧离子镀工艺,调节N2分压制备了系列(Ti,Al)N硬质涂层,研究了不同N2分压对涂层表面形貌、相结构、成分及力学性能的影响.结果表明,当氮气分压较低时,涂层金属相含量较高,涂层硬度和残余应力较低,膜/基结合力较高,涂层耐磨性较差;当氮气分压较高时,涂层氮化物相含量较高,涂层硬度和残余应力较高,膜/基结合力偏低,涂层耐磨性很强.Effects of N2 partial pressure on composition, structure and mechanical properties in （Ti, A1）N coatings by arc ion plating （/kiP）, were systematically investigated. The results indicate that, when N2 partial pressure increases from 0.2Pa to 0.8Pa, metal phase of （Ti, A1）N coating reduces and nitride phase increases, hardness and residual stress of the coating increase, film/substrate adhesion strength decreases and abrasive resistance of the coating improves.

关 键 词：(Ti Al)N 电弧离子镀 N2分压 

分 类 号：TG174.4[金属学及工艺—金属表面处理]