一种类石墨薄膜的场发射研究  

Field Electron Emission Research on Graphite-like Film

作　　者：马会中[1] 张兰[1] 姚宁[2] 毕兆琪[2] 张兵临[2] 胡欢陵[3] 

机构地区：[1]郑州工业大学数理系,郑州450002 [2]郑州大学物理工程学院,郑州450052 [3]中国科学院安徽光机所,合肥230031

出　　处：《中国激光》2000年第4期363-366,共4页Chinese Journal of Lasers

基　　金：863计划新材料领域资助项目

摘　　要：利用 Kr F准分子激光器及聚酰亚胺靶在硅衬底上沉积出了类石墨薄膜。借助于 X射线光电子谱及 Raman光谱手段对薄膜微结构进行了分析。并用该薄膜作阴极 ,研究了其场发射特性。实验结果显示出该薄膜具有较好的场电子发射性能 ,发射点密度高达 1× 1 0 5 / cm2 以上。The graphite like film was prepared by pulsed laser deposition technique (PLD) using a KrF excimer laser (λ=248 nm). The structure of the film was investigated using X ray Photo electron Spectroscopy (XPS) and Raman spectroscopy, it indicates that graphite structure existes in this film. The mechanism of the field emission from the film was discussed. The emission site density of the film more than 1×10 5/cm 2 was obtained. The experimental results indicate that the graphite like film could be a new type of a cold cathode electronic source for use.

关 键 词：类石墨薄膜 场电子发射 准分子激光器 

分 类 号：TN304.055[电子电信—物理电子学] O484[理学—固体物理]