使用光刻法在金刚石台面制备金属薄膜电极  

Fabrication of metal thin film electrodes on culet of diamond by photolithography

作　　者：赵庆娟 

机构地区：[1]青岛双瑞海洋环境工程股份有限公司,山东青岛266101

出　　处：《超硬材料工程》2012年第2期19-21,共3页Superhard Material Engineering

摘　　要：金刚石对顶砧是实验室常用的产生流体静力学压力的装置,其核心部件是两颗对顶的金刚石。金刚石具有其它材料难以比拟的超高硬度和对电磁波的高透过率,所以金刚石压砧在高压研究中扮演着重要的角色。文章介绍一种光刻法在金刚石台面上制备金属薄膜电极用以测量材料电阻率的工艺。Diamond anvil cell （DAC} is widely used in the laboratory to generate hydrostatic pressure. The key component of DAC is a pair of opposing diamonds. DAC has been playing an important role in high pressure research due to the unrivalled hardness and high transparency to electromagnetic waves of diamond. This paper introduces a technique aimed at measuring the resistivity of materials via metal thin film electrodes which are fabricated on diamond culet by photolithography.

关 键 词：金刚石对顶砧 高压 流体静力学压力 金属薄膜电极 

分 类 号：TQ164[化学工程—高温制品工业]