短脉冲激励的混响室设计  

Design of reverberation chamber excited by short pulse

作　　者：李爽[1] 王建国[1,2] 

机构地区：[1]西北核技术研究所,西安710024 [2]西安交通大学电子信息工程学院,西安710049

出　　处：《强激光与粒子束》2012年第6期1439-1444,共6页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(60971080)

摘　　要：根据理想封闭矩形腔体内电磁场表达式,分析了对混响室内场特性有影响的因素;结合混响室的参数要求,对混响室模型的设计进行了研究,并确立了适用于短脉冲激励下的混响室的场均匀性分析指标;通过对比电场分布的均匀性,重点研究腔体形状和源搅拌方法对腔体内场分布的影响,采用连续10次移动激励源的方法可以将场分布标准差降低约0.4dB。数值模拟结果表明:采用类似复杂腔的结构,在矩形腔的基础上引入若干复杂结构,可以有效地提高场分布的均匀性,有利于在腔内构造均匀的电磁环境;证明了连续移动激励源位置这一源搅拌方法的可行性,通过该方法可以有效地提高场分布的均匀性。According to the distributions of electromagnetic field in an ideal resonator,the parameters affecting the field distribution were summarized firstly.Then the model of reverberation chamber（RC） was designed according to accustomed rules and special standards to judge the field uniformity in this kind of RC were also established.Lastly the influences of the cavity shape and the method of source stirring on the characteristics of the electric field in the RC were analyzed.The standard deviation of electric field in the RC is reduced by 0.4 dB by moving the source continuously along ten positions.The numerical simulation shows that the usage of the complex resonator is effective to improve the homogeneity of the field and validates the feasibility of moving the source continuously in the RC excited by short pulse to improve the field uniformity.

关 键 词：混响室 场均匀性 源搅拌 电磁效应 

分 类 号：O441.4[理学—电磁学]