几种含氮有机物分子结构与电化学行为的关联  

Correlations between Properties and Structures of Some Nitrogen-containing Compounds during Tin Electrodeposition in Acidic Media

作　　者：高学朋[1] 张莹莹[1] 孙红旗 陈春 贺岩峰[1] 

机构地区：[1]长春工业大学化工学院,长春130012 [2]上海新阳半导体材料股份有限公司,上海201616

出　　处：《复旦学报（自然科学版）》2012年第2期179-183,共5页Journal of Fudan University：Natural Science

基　　金：吉林省自然科学基金资助项目(20101532)

摘　　要：以几种具有不同结构的含氮有机分子作为添加剂,研究了它们在锡电沉积中的电化学特性.把含氮有机分子样品根据结构划分成3类,在铜旋转圆盘电极(Cu-RDE)上分别进行了极化曲线(LSV)和电化学阻抗谱(EIS)的测试,以了解添加剂分子结构的影响,为建立电沉积添加剂的结构与性能关系进行探索性研究.It is focused on the investigations of some nitrogen containing compounds with different structures as additives in tin electrodeposition. To understand the influence of functional group attached with nitrogen atom, samples were divided into three categories according to structures. The polarization curves （LSV） and electrochemical impedance spectroscopy （EIS） measurements were made on Cu-RDE to see how the metal electrode/electrolyte interface is affected by the structure of the additive molecules. The aim is to give some evidences of the relationship between electrochemical properties and structures of electrodeposition additive.

关 键 词：含氮化合物 分子结构 电沉积 添加剂 

分 类 号：TQ153[化学工程—电化学工业]