准分子激光对钛搪瓷打标的研究  

Study of marking to enamelware with excimer laser

作　　者：文小明[1] 史明霞[1] 杨雪玲[1] 

机构地区：[1]云南大学物理系,昆明650091

出　　处：《激光技术》2000年第1期9-11,共3页Laser Technology

基　　金：云南省自然科学基金

摘　　要：用308nm准分子激光对钛搪瓷进行了打标实验,在适当的功率密度下,获得了精细可见的标记。该能量密度远低于红外激光对陶瓷类材料打标的能量密度,也比基于汽化刻蚀原理用紫外激光对陶瓷材料打标的能量密度低得多。通过实验得出了打标的阈值和优选参数,对准分子激光作用变色的机理进行了分析。The experiments of marking to enamelware with 308nm excimer laser are finished. A fine and visible pattern can be acquired when the enamelware sample is irradiated by one or several 308nm excimer laser pulses if their fluences are over the marking threshold. The marking fluence threshold is far lower than that based on the vaporizing and etching principle. The marking mechanism is studied in this paper and the conditions of marking are optimized in experiments.

关 键 词：激光打标 准分子激光 钛搪瓷 

分 类 号：TN249[电子电信—物理电子学]