钨表面双辉等离子渗镍组织及机理  

Mechanism and Microstructure of Ni Coating on W Prepared by Double Glow Plasma

作　　者：孟氢钡[1] 沈以赴[1] 杨宗辉[1] 陈文华[1] 

机构地区：[1]南京航空航天大学材料科学与技术学院,南京210009

出　　处：《南京航空航天大学学报》2012年第3期405-408,共4页Journal of Nanjing University of Aeronautics & Astronautics

基　　金：江苏省自然科学基金(BK2007201)资助项目;江苏省科技大学先进焊接技术省级重点实验室开放研究基金(JSAWT-06-02)资助项目

摘　　要：采用双辉等离子渗金属技术在钨表面进行渗镍实验,并采用XRD,SEM,EDX等分析手段对渗镍试样的微观组织进行了表征。结果表明,镍改性层与基体结合良好,无明显缺陷。改性层与基体表面之间存在明显的扩散层,扩散层中存在少量NiW和Ni4W中间相。利用划痕法研究了渗镍层与基体间的结合强度。结果表明:持续加载100 N未发生改性层剥落现象。对钨表面双辉等离子渗镍改性层的形成机制进行了探讨。A Ni-modified coating is prepared on the W substrate by double glow plasma method. Microstructure of as-prepared coating are examined by XRD, SEM and EDX, respectively. The results indicate that a good combination of Ni coating and W substrate, with no significant defects, is obtained. The transition layer, containing few NiW and Ni4W interphases, forms between the Ni coating and W substrate. The adhesive strength between the Ni layer and the substrate is studied by using the scratch method. Results show that the alloying layer does not flaked till continuously loading to 100 N. The formation mechanism of transition layer is discussed.

关 键 词：双辉等离子 镍 钨 冶金结合 

分 类 号：TB941[一般工业技术—计量学]