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作 者:白振伟[1,2] 周旭光[1] 刘俊龙[2] 阎秋生[2]
机构地区:[1]深圳职业技术学院机电工程学院,广东深圳518055 [2]广东工业大学机电工程学院,广东广州510006
出 处:《金刚石与磨料磨具工程》2012年第3期18-23,共6页Diamond & Abrasives Engineering
基 金:深圳职业技术学院校重点项目(No.2209K3020002);深圳市科技项目(No.2111K3020004)
摘 要:采用集群磁流变效应研磨加工方法对氮化铝(AlN)陶瓷基片进行研磨加工,系统地分析了主要工艺参数的影响和最终经过精密研磨后的加工表面形貌特征。结果表明,集群磁流变效应研磨加工方法可以实现对氮化铝(AlN)陶瓷基片的高效率高精度研磨加工,原始表面Ra1.730μm经过粗研10 min和精研30 min后可以达到0.029μm,下降两个数量级。在粗研阶段,选用二氧化硅磨料#4000、磨料体积分数12%、研磨盘转速150 r/min、研磨压力3.5 kPa,可以获得较高的材料去除率和较光滑的加工表面。Grinding experiment on A1N substrate by cluster magnetorheological effect (MR-effect) was conducted, the influence of the main experimental parameters and the feature of machined surface morphology were systematically studied. The results demonstrated that grinding A1N substrate by cluster MR-effect was feasible, and high material removal with good surface quality could be achieved. After 10 rain grinding and 30 rain fine finishing, the original surface roughness Ra 1. 7302 μm was reduced to Ra 0.0290 μm, which means a reduction by two orders of magnitude. During the first stage grinding, optimal parameters including #4000 SiO2 abrasive at concentration 12% (volume fraction) , the grinding disc speed 150 r/rain, and the grinding pressure 3.5 kPa were suggested to obtain a high machining efficiency with smooth machined surface.
关 键 词:氮化铝(AlN)陶瓷基片 集群磁流变效应 研磨加工 表面粗糙度
分 类 号:TG58[金属学及工艺—金属切削加工及机床]
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