Photodetachment microscopy of a hydrogen negative ion in an electric field near a metal surface  

作　　者：唐田田 王德华 王姗姗 

机构地区：[1]School of Physics and Optoelectronic Engineering,Ludong University

出　　处：《Chinese Physics B》2012年第7期250-256,共7页中国物理B（英文版）

基　　金：Project supported by the National Natural Science Foundation of China (Grant Nos. 11074104 and 10604045);the Higher Educational Science and Technology Program of Shandong Province, China (Grant No. J09LA02)

摘　　要：According to the semi-classical theory, we study the photodetachment microscopy of H- in the electric field near a metal surface. During the photodetachment, the electron is photo-detached by a laser and the electron is drawn toward a position-sensitive detector. The electron flux distribution is measured as a function of position. Two classical paths lead the ion to any point in the classically allowed region on the detector, and waves traveling along these paths produce an interference pattern. If the metal surface perpendicular to the electric field is added, we find that the interference pattern is related not only to the electron energy and the electric-field strength, but also to the ion surface distance. In addition, the laser polarization also has a great influence on the electron flux distribution. We present calculations predicting the interference pattern that may be seen in experiment. We hope that our study can provide a new understanding of the electron flux distribution of negative ions in an external field and surface, and can guide future experimental research on negative ion photo-detachment microscopy.According to the semi-classical theory, we study the photodetachment microscopy of H- in the electric field near a metal surface. During the photodetachment, the electron is photo-detached by a laser and the electron is drawn toward a position-sensitive detector. The electron flux distribution is measured as a function of position. Two classical paths lead the ion to any point in the classically allowed region on the detector, and waves traveling along these paths produce an interference pattern. If the metal surface perpendicular to the electric field is added, we find that the interference pattern is related not only to the electron energy and the electric-field strength, but also to the ion surface distance. In addition, the laser polarization also has a great influence on the electron flux distribution. We present calculations predicting the interference pattern that may be seen in experiment. We hope that our study can provide a new understanding of the electron flux distribution of negative ions in an external field and surface, and can guide future experimental research on negative ion photo-detachment microscopy.

关 键 词：photodetachment microscopy electron flux distribution semi-classical theory 

分 类 号：O562[理学—原子与分子物理]