高光谱成像仪的杂散光分析  

Stray light analysis for hyper-spectral imaging spectrometer

作　　者：王美钦[1,2] 王忠厚[1] 白加光[1] 

机构地区：[1]中国科学院西安光学精密机械研究所,陕西西安710119 [2]中国科学院研究生院,北京100049

出　　处：《红外与激光工程》2012年第6期1532-1537,共6页Infrared and Laser Engineering

基　　金：西部之光基金

摘　　要：杂光分析是保证高光谱成像仪成像质量的关键技术之一。详细分析了高光谱成像仪光学系统的杂散光,设计了R-C前置镜的遮光罩和挡光环,并用Tracepro软件对高光谱成像仪光学系统进行了光机建模,分析了系统的一次、二次散射面,根据重要杂散光路径设置重点采用,计算出0.5°~40°不同离轴角度下的点源透射比值,从而得到地球表面反射光在像面产生的照度为5.5×10-3W/m2,小于中心视场光线在像面照度的3.5%,满足系统抑制杂散光的要求。Stray light analysis is one of the crucial technologies to ensure the imaging quality of hyper- spectral imager system. The detailed stray light analysis for hyper-spectral imager system was described. Firstly, the primary baffle, secondary baffle and outer baffle were designed. Secondary, the solid model of the hyper-spectral imager system was constructed in Tracepro software and the first and second order scattering surface were determined, then important sampling was installed on the major scattering path. At last, the Point Sources Transmittance was calculated at different off-axis angle between 0.5^-40~. According to the Point Source Transmittance, the illumination of surface reflected light is 5.5 xl0-3 W/m2 out of critical angle of stray light between 0.5°-40°, which is 3.5% less than the illumination of central field of view. The analysis result shows that the stray light can meet the requirement.

关 键 词：高光谱成像仪 杂散光分析 遮光罩设计 挡光环 PST曲线 

分 类 号：O439[机械工程—光学工程]