二氧化硅增透膜微观结构与激光损伤阈值的调控  

Control of microstructure and laser induced damage threshold of antireflective silica films

作　　者：晏良宏[1] 吕海兵[1] 严鸿维[1] 赵松楠[1] 王韬[1] 李熙斌[1] 王海军[1] 袁晓东[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2012年第7期1745-1748,共4页High Power Laser and Particle Beams

基　　金：中国工程物理研究院激光聚变研究中心和等离子体国家重点实验室创新基金项目

摘　　要：采用溶胶-凝胶技术制备了二氧化硅增透膜,通过向溶胶中添加高分子聚乙烯醇缩丁醛(PVB),调控胶体的粒径,进而控制膜层微观结构,研究膜层微观结构与激光损伤阈值的关系。纳米粒度仪和扫描探针显微镜测试表明:PVB加入溶胶后,控制了二氧化硅胶粒的生长,使二氧化硅胶粒生长更均匀,因而膜层的微观结构更均匀。当PVB质量分数为1%时,胶体粒径为15nm,分散系数小于0.1。用该胶体镀膜,膜层均匀,表面粗糙度小于3.25nm。并且PVB加入后增加了膜层胶粒间的黏附性,使得膜层强度增大。PVB加入使膜层的激光损伤阈值有所增加。当PVB的添加量为1%时,膜层的激光损失阈值从30.0J/cm2增加到40.1J/cm2。膜层激光损伤阈值的增加与膜层微观均匀性和物理强度的增加有关。Polyvinyl butyral（PVB） modified antireflective silica films were deposited on fused silica substrates by sol-gel process.The effect of PVB on the microstructure and laser induced damage threshold（LIDT） of the films was investigated.The results of nanoparticle analyzer,and scanning probe microscope show that PVB molecules surround and control the growth of silica particles,resulting in a stable sol with uniformly distributed silica particles.As a result,the film deposited from these PVB modified sols possesses uniform microstructures.The optimal PVB modified silica film has surface roughness of 3.25 nm.The adhesive-resistance test exhibits that the strength of PVB modified silica film increases due to the bond reaction between PVB molecules and silica particles.The addition of PVB to silica sol increases the LITD of films.By adding 1.0% PVB to silica sol,the LIDT of films increases from 30.0 J/cm2 to 40.1 J/cm2.The increase in LIDT is attributed to the increase in film strength and uniformity of film microstructures as an effect of PVB modification.

关 键 词：二氧化硅增透膜 激光损伤阈值 微观结构 溶胶-凝胶 

分 类 号：O484[理学—固体物理]