光敏表面活性剂的研究进展及应用前景  

Research development and application prospect of photoresponsive surfactant

作　　者：何姗姗[1] 田森林[1] 龙坚[1] 杨志[1] 曾俊[1] 

机构地区：[1]昆明理工大学环境科学与工程学院,云南昆明650500

出　　处：《化学研究与应用》2012年第7期1015-1019,共5页Chemical Research and Application

基　　金：国家自然科学基金项目(20607008;21077048)资助

摘　　要：本文综述了光敏表面活性剂的研究进展,指出光敏表面活性剂因所含光敏基团的不同,会发生不同类型的光化学反应,其反应类型主要有光异构、光裂解、光致极性变化、光聚合等几种;并根据光敏表面活性剂的优良特性,介绍了其在环境修复、纳米材料制备、生物医药等方面的应用现状,同时展望了应用前景。This paper summarized the research progress of photosensitive surfactants,pointd out photosensitive surfactants which contain different photosensitive groups would cause different types of photochemical reactions,such as photo-induced isomerizations、photoscission reactions、photo-induced polarity changes、photo-induced polymerization and so on.According to the good properties of the photosensitive surfactants,this paper introduced the aspects of the application status and prospected the application prospects of these aspects,like environmental remediation,nanometer material preparation,biological medicine etc.

关 键 词：光敏表面活性剂 光化学反应 应用前景 

分 类 号：TQ423[化学工程]