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作 者:刘涛[1] 李天博[1] 赵永刚[1] 朱美红[1] 张留碗[1] 黄贺生[1] 刘梦林[1] 鲁丽[2] 周岳亮[2] 何萌[2] 吕慧宾[2] 曹必松[2]
机构地区:[1]清华大学物理系 [2]中国科学院物理研究所光物理实验室,北京100080
出 处:《低温物理学报》2000年第4期315-320,共6页Low Temperature Physical Letters
基 金:深圳华为公司科技基金;国家自然科学基金
摘 要:The morphology of the silver films deposited and annealed on YBa2Cu3O7- δ films and the corresponding surface contact resistivities have been systematically investigated. We obtained the minimum surface contact resistivity of 6 x 10- 8’ cm2(77K)by annealing Ag/YBa2Cu3O7- δ contacts at the optimum temperature Of 475℃. The effect of annealing temperatures on the contact resistivities was explained by considering foe morphology of the silver films and the diffusion of silver into YBCO.The morphology of the silver films deposited and annealed on YBa2Cu3O7- δ films and the corresponding surface contact resistivities have been systematically investigated. We obtained the minimum surface contact resistivity of 6 x 10- 8' cm2(77K)by annealing Ag/YBa2Cu3O7- δ contacts at the optimum temperature Of 475℃. The effect of annealing temperatures on the contact resistivities was explained by considering foe morphology of the silver films and the diffusion of silver into YBCO.
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