用于红外焦平面阵列非均匀性校正的辐射参考源  

Reference Source for Non-uniformity Correction of the Infrared Focal Plane Arrays

作　　者：金明磊[1] 金伟其[1] 刘崇亮[1] 范永杰[1] 

机构地区：[1]北京理工大学光电学院"光电成像技术与系统"教育部重点实验室,北京100081

出　　处：《红外技术》2012年第7期383-388,共6页Infrared Technology

基　　金：国家自然科学基金项目(60877060);十一五总装预研项目(404050301)

摘　　要：概述了4种红外焦平面阵列非均匀性过程中使用到的参考源。成为产品前,通常使用面源黑体作为参考源对红外焦平面阵列进行非均匀性校正;在热成像系统应用中动态非均匀性校正中,普遍使用的辐射挡板由于没有连有控温装置,只能进行一点校正,在场景温度偏离校正温度时,校正效果会受到影响;美国第三代前视红外成像系统中使用连有热电制冷器的热电参考源,利用热电制冷器对发射表面进行控温,可实现两点校正算法;为基于边框的SBNUC校正算法设计的U型边框黑体光阑,对视场中心没有遮挡,利用半导体制冷器对U型边框黑体光阑的进行控温,能根据场景信息自适应地实现的两点校正。This paper introduced four reference sources used for reference-based non-uniformity correction of the infrared focal plane arrays. A surface blackbody is commonly used to perform non-uniformity correction in thermal imaging systems, and further correction can be performed during the process of using. The radiation shield is widely used in thermal imaging systems. It initially executes one-point correction without temperature control device. When the scene temperature deviates from the calibration temperature, the calibration results will be affected. The third generation imaging system exploits thermoelectric thermal reference sources （TTRS） with a thermoelectric cooler （TEC） Which is used to control the temperature of the flat emitter substrate to achieve two-point calibration. The virtual perimeter diaphragm strips is designed for two-point non-uniformity correction algorithm along the rim. It only blocks the edge of the whole field of view （FOV） without covering the central FOV and uses the temperature control device to control the temperature of the rim, and realizes adaptive two-point calibration.

关 键 词：非均匀性校正 面源黑体 辐射挡板 热电参考源 U型边框黑体 

分 类 号：TN219[电子电信—物理电子学]