测量微小粒子高度的显微投影方法研究  

Research of Minute-Particle Height Measurement Method Based on Microscopic Imaging and Projection Optics

作　　者：唐春晓[1] 李恩邦[1] 吴亚北[2] 

机构地区：[1]天津工业大学电子与信息工程学院,天津300387 [2]西南交通大学信息科学与技术学院,四川成都610031

出　　处：《激光与光电子学进展》2012年第8期90-94,共5页Laser & Optoelectronics Progress

基　　金：国家自然科学基金(60877049;61177078);高等学校博士学科点专项科研基金(20101201120001)资助课题

摘　　要：在半导体生产过程中,半导体基片在生长制作时表面会存在一些细微突起的结构,这些突起的尺寸通常为微米量级,若突起的尺寸过高,在流水线上被打磨抛光时极易产生不合格的产品,从而影响生产效率。因此,需对平面上单一(或几个稀疏分布的)非球形粒子的高度进行实时在线测量。针对这一问题提出了一种测量微小粒子高度的方法:显微投影法。介绍了基于显微投影法的微小粒子高度测量系统,实现了约100μm高度的单一不规则形状微小粒子的测量。There are some minute peaked particles on the surface of semiconductor substrate during production.Sizes of the particles are usually several microns.If the height of any particle exceeds a standard value,there will be many defect wares during snagging and buffing when processed on the assembly-line.All that could affect the producing efficiency.It is desired to give test simultaneously on the height of single or several sparsely distributed non-spherical particles.We aim at offering a method to measure the height of minute particles.We also introduce a system of measuring small particle′s height on the basis of microscopic projection and successfully measure single randomly shaped minute particle with height around 100 μm.

关 键 词：测量 图像处理 显微成像 投影光学 

分 类 号：TN29[电子电信—物理电子学]