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出 处:《Chinese Optics Letters》2012年第B06期168-173,共6页中国光学快报(英文版)
摘 要:A fixed abrasive technology combined with computer controlled optical surfacing is discussed, and a removal function model for multi-pellet polishing pad is established based on the removal function theory of planar motion. The parameters of the model, such as the movement eccentricity of the polishing pad and the distance between pellets, are optimized by introducing a approaching factor and a curve RMS distance in the simulation. The comparison of the theoretical model and the experimental results indicate that the error between the theoretical maximum removal rate and the experimental data is 0.0073 #m/min, and its error ratio is 5.58~; the RMS distance error between the theoretical removal function curve and the experimental curve is 0.0849 /~m and its error ratio is 7.01%. The veracity of the theoretical model is verified by experimental results, which predicts the feasibility of the fixed abrasive polishing technology and establishes a promising basis for the SiC mirror precision fabrication field.A fixed abrasive technology combined with computer controlled optical surfacing is discussed, and a removal function model for multi-pellet polishing pad is established based on the removal function theory of planar motion. The parameters of the model, such as the movement eccentricity of the polishing pad and the distance between pellets, are optimized by introducing a approaching factor and a curve RMS distance in the simulation. The comparison of the theoretical model and the experimental results indicate that the error between the theoretical maximum removal rate and the experimental data is 0.0073 #m/min, and its error ratio is 5.58~; the RMS distance error between the theoretical removal function curve and the experimental curve is 0.0849 /~m and its error ratio is 7.01%. The veracity of the theoretical model is verified by experimental results, which predicts the feasibility of the fixed abrasive polishing technology and establishes a promising basis for the SiC mirror precision fabrication field.
分 类 号:O4-33[理学—物理] TP273[自动化与计算机技术—检测技术与自动化装置]
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