工艺参数对水体系中电沉积制备Ir层表面形貌的影响(英文)  

Effect of Technical Parameters on Surface Morphology of Electrodeposition of Iridium Layer in Aqueous System

作　　者：钱建刚[1] 肖世明[1] 赵天[1] 栾海静[1] 

机构地区：[1]北京航空航天大学仿生智能界面科学与技术教育部重点实验室,北京100191

出　　处：《稀有金属材料与工程》2012年第7期1139-1143,共5页Rare Metal Materials and Engineering

基　　金：NSFC(51071014);ASFC(2010ZE51055)

摘　　要：在水体系中利用直流电沉积的方法以IrCl3为主盐在铂基体上制备出了Ir层。利用SEM、EDS和XPS对不同工艺参数下所制备Ir层的表面形貌及成分进行了分析,并最终获得了最优的电沉积工艺条件。结果表明:IrCl3主盐浓度对Ir层形貌有较大影响,浓度太低时电沉积的铱层太薄,导致铱层易起皮或产生裂纹,故适当提高主盐的浓度有利于改善Ir层质量;在一定的pH值范围内,电沉积所制备的Ir层表面形貌差别不大,表面均比较平整,Ir颗粒比较均匀、致密;电流密度对Ir层表面形貌尤其是对Ir层结晶颗粒的大小和致密性影响较大;电沉积溶液的温度太低时,不能沉积出Ir层,温度太高时,则沉积出的Ir层粗糙、表面形貌不均匀。Iridium layer was prepared on platinum substrate under constant current in aqueous system using anhydrous iridium chloride as precursors. The surface morphology and the composition of the iridium layer were characterized by SEM, EDS and XPS. The optimized condition was derived. The results show that the concentration of iridium chloride has great influence on the surface morphology of the iridium layer. When the concentration is low, too thin iIidium layer is formed, resulting in peeling or cracking. Therefore, an appropriate increase in the concentration of the precursors will help to improve the quality of the Ir layer. In a certain range ofpH values, the surface morphologies of the iridium layers prepared on different conditions are nearly the same. The surface is smooth and iridium particles are uniform and dense. Current density has great influence on the surface morphology of the iridium layer, especially on the size and the density of crystalline particle. The iridium layer cannot be deposited at low solution temperature. Whereas the iridium layer is rough and its surface morphology is uneven at too high temperature.

关 键 词：电沉积 铱 工艺参数 

分 类 号：TG174.4[金属学及工艺—金属表面处理]