氯化物镀锌层表面粗糙度的影响因素及其控制  

Influence Factors and Control of Coating Surface Roughness in Chloride Zinc Plating

作　　者：苗青林[1] 张丽君[1] 

机构地区：[1]河南科技学院,河南新乡453003

出　　处：《电镀与环保》2012年第4期7-9,共3页Electroplating & Pollution Control

摘　　要：采用不含添加剂的氯化物镀液电沉积锌层,探讨了电流密度、镀液温度和镀液pH值对镀层表面粗糙度的影响规律,并优选出最佳的工艺参数。结果表明:在电流密度1A/dm2,镀液温度50℃,镀液pH值5.5的条件下,所得镀层的表面粗糙度最低,约为1.267μm。The zinc coating was electrodeposited using chloride solution without additive,and the influence rules of current density,bath temperature and bath pH value on its surface roughness were investigated.And the optimal process parameters were selected.The results show that the zinc coating obtained under the conditions of current density 1 A/dm2,bath temperature 50 ℃ and bath pH value 5.5 has the lowest surface roughness,about 1.267 μm.

关 键 词：表面粗糙度 镀锌层 电流密度 镀液温度 镀液pH值 

分 类 号：TQ153[化学工程—电化学工业]