A PNPN tunnel field-effect transistor with high-k gate and Iow-k fringe dielectrics  

A PNPN tunnel field-effect transistor with high-k gate and Iow-k fringe dielectrics

在线阅读下载全文

作  者:崔宁 梁仁荣 王敬 周卫 许军 

机构地区:[1]Tsinghua National Laboratory for Information Science and Technology,Institute of Microelectronics,Tsinghua University

出  处:《Journal of Semiconductors》2012年第8期54-59,共6页半导体学报(英文版)

基  金:Project supported by the State Key Development Program for Basic Research of China(No.2011CBA00602);the National Natural Science Foundation of China(Nos.60876076,60976013,60820106001)

摘  要:A PNPN tunnel field effect transistor(TFET) with a high-k gate dielectric and a low-k fringe dielectric is introduced.The effects of the gate and fringe electric fields on the TFET's performance were investigated through two-dimensional simulations.The results showed that a high gate dielectric constant is preferable for enhancing the gate control over the channel,while a low fringe dielectric constant is useful to increase the band-to-band tunneling probability.The TFET device with the proposed structure has good switching characteristics,enhanced on-state current,and high process tolerance.It is suitable for low-power applications and could become a potential substitute in next-generation complementary metal-oxide-semiconductor technology.A PNPN tunnel field effect transistor(TFET) with a high-k gate dielectric and a low-k fringe dielectric is introduced.The effects of the gate and fringe electric fields on the TFET's performance were investigated through two-dimensional simulations.The results showed that a high gate dielectric constant is preferable for enhancing the gate control over the channel,while a low fringe dielectric constant is useful to increase the band-to-band tunneling probability.The TFET device with the proposed structure has good switching characteristics,enhanced on-state current,and high process tolerance.It is suitable for low-power applications and could become a potential substitute in next-generation complementary metal-oxide-semiconductor technology.

关 键 词:TFET subthreshold swing high-k dielectric low-k dielectric fringe electric field 

分 类 号:TN386[电子电信—物理电子学] O441.1[理学—电磁学]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象