氨水浓度对化学浴沉积的Zn(O,S)薄膜形貌、结构和性能的影响  

Influence of Ammonia Concentration on Morphology,Structure and Properties of Zn(O,S) Films Prepared by Chemical Bath Deposition

作　　者：刘军[1] 魏爱香[1] 招瑜[1] 刘俊[1] 庄米雪[1] 

机构地区：[1]广东工业大学材料与能源学院,广州510006

出　　处：《人工晶体学报》2012年第4期936-941,共6页Journal of Synthetic Crystals

基　　金：广东省省部产学研项目(2011A090200003);广州市科技计划项目(12C52111614)

摘　　要：采用化学浴法,以ZnSO4.7H2O和SC(NH2)2作为反应前驱物,C6H5O7Na3.2H2O作为络合剂,NH3.H2O作为辅助络合剂和缓冲剂制备Zn(O,S)薄膜。采用SEM、EDS、XPS、XRD和透射光谱分析方法,研究氨水浓度对化学浴法制备的Zn(O,S)薄膜形貌、成分、结构和光学性能的影响以及Zn(O,S)薄膜的形成机理。结果表明:Zn(O,S)薄膜是由ZnO和ZnS纳米颗粒混合组成的,ZnO具有纤锌矿结构,ZnS是以非晶相存在。随着反应溶液中氨水浓度的降低,薄膜中所包含的ZnO逐渐减少,ZnS逐渐增加,S/Zn原子比逐渐增加,透射率和光学带隙也逐渐增大。The Zn（ O, S） thin films were prepared by chemical bath deposition （CBD） using ZnSO4· 7H2O and SC （NH2） 2 as the precursors, C6H5O7Na3 · 2H2O as the complexing agent, NH3 · H2O as the auxiliary complexing agent and buffer agent. The obtained thin films were characterized by scanning electron microscopy（ SEM）, energy dispersive spectrometer（EDS） ,X-ray diffraction（XRD） and UV-Vis spectrophotometry. The morphology, structure and optical properties of Zn （O, S ） thin films were investigated as a function of ammonia concentration in precursors. The results reveal that Zn （ O, S） films are composed of ZnO nano-particles and ZnS nano-particles. ZnO is wurtzite structure and ZnS is amorphous. As the ammonia concentration decreasing, the proportion of ZnO decreases while that of ZnS increases gradually. In the meanwhile, S/Zn atom ratios, transmission and optical band gap all increase.

关 键 词：Zn(O S)薄膜 化学水浴法 透射率 光学带隙 

分 类 号：O484[理学—固体物理]