硅表面自组装膜的构建及其摩擦学性能研究进展  

Construction of Self-assembled Films on Silicon and Their Tribological Behavior

作　　者：潘鹤[1] 滕淑华[1] 丁翠翠[1] 

机构地区：[1]中国矿业大学材料科学与工程学院,徐州221116

出　　处：《材料导报》2012年第15期27-31,共5页Materials Reports

基　　金：国家重点基础研究发展计划(973)项目(2007CB607605);中央高校基本科研业务费专项资金(2011QNA06)

摘　　要：总结了目前在单晶硅表面构建的几类典型的分子自组装膜,并着重介绍了近十几年里各类自组装膜在摩擦学性能研究方面所取得的进展。单层膜能够有效降低硅基底的摩擦系数,但是其承载能力和抗磨损性能较差,其中较为典型的是OTS(十八烷基三氯硅烷)自组装膜;有机双层膜和多层膜的出现,一定程度上改善了单层膜的承载能力和耐磨性,但膜的有序性和稳定性还有待于进一步的提高;近年来,有机/无机复合膜的研究为改善硅表面的摩擦学性能提供了一条新的途径,有望成为今后该领域研究的一个重要方向。Several types of selfassembled films fabricated on the silicon substrates are summarized, and the in vestigation progress on their tribological properties over the past 10 years are mainly introduced. Selfassembled mono layers （SAMs） are effective in reducing the friction coefficient of the silicon surface, but their loading capacity and wear resistance are poor. OTS（octadecyltrichlorosilane）SAMs are the representative of this type. Double and multi layer organic films compensate to some extent for the above defects of the monolayer films. However, their orienta tion and stability need to be further optimized. The advent of inorganic/organic composite films in recent years pro vides a new way to enhance the tribological properties of the silicon surface, which is desirable to become an important direction of future research.

关 键 词：单晶硅 自组装膜 摩擦学性能 微型电子机械系统 

分 类 号：O7[理学—晶体学]