Fabrication and characterization of sliced multilayer transmission grating for X-ray region  

作　　者：黄秋实 李浩川 朱京涛 王晓强 王占山 陈玲燕 唐永建 

机构地区：[1]Key Laboratory of Advanced Micro-Structured Materials,MOE,Institute of Precision Optical Engineering,Department of Physics,Tongji University [2]Research Center of Laser Fusion,China Academy of Engineering Physics

出　　处：《Chinese Optics Letters》2012年第9期6-8,共3页中国光学快报（英文版）

基　　金：supported by the National Natural Science Foundation of China (Nos. 10825521 and10905042);the National "973" Program of China (No.2011CB922203);the Natural Science Foundation of Shanghai (No. 09ZR1434300)

摘　　要：To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi2/Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a super- polished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23-25 ttm. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the lst-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi2/Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a super- polished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23-25 ttm. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the lst-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.

关 键 词：Aspect ratio DIFFRACTION MULTILAYERS X rays 

分 类 号：O434.1[机械工程—光学工程] TH741.6[理学—光学]