二甲基亚砜溶剂中Y-Ni合金膜的制备  

Preparation for Y Ni alloy film in dimethylsulfoxide electrolyte solution

作　　者：童叶翔[1] 刘冠昆[1] 何山[1] 王宇[1] 

机构地区：[1]中山大学化学与化学工程学院,广州510275

出　　处：《中国有色金属学报》2000年第3期448-450,共3页The Chinese Journal of Nonferrous Metals

基　　金：广东省自然科学基金资助项目 ( 960 0 0 2 )

摘　　要：利用循环伏安法和恒电位电解法研究了室温下在二甲基亚砜溶剂 (DMSO)中Y Ni功能合金膜的电沉积制备。结果表明 ,在YCl3 (0 .10mol·L-1) NiCl2 (0 .10mol·L-1) DMSO溶液中 ,控制电位在 - 1.15～ - 2 .5 0V范围内进行恒电位电解 ,可得到有金属光泽、附着力强的银灰色非晶态Y Ni合金膜 ,厚度约为 1.4μm。Y Ni合金膜中Y的含量在 3.5 %～ 80 %范围内随阴极电位的负移而增加。The electrodeposition of Y Ni alloy film from dimethylsulfoxide (DMSO) electrolyte solution was investigated using cyclic voltammetry and potentiostatic technique. The cyclic voltammograms of Pt and Cu electrodes in YCl 3(0.10 mol·L -1 ) NiCl 2 (0.10 mol·L -1 ) DMSO were measured, which indicate that the Y Ni alloy can be electrodeposited. The Y Ni film on Cu electrode was obtained by potentiostatic electrolysis at -1.15～-2.50 V (vs SCE). The Y Ni film is amorphous, Y content is in the range of 3.5% ～80% and thickness is about 1.4 μm analyzed by EDAX and XRD. The Y content in deposited film increases with the shift of cathode potential to negative direction. [

关 键 词：Y-Ni合金膜 电沉积 二甲基亚砜溶剂 

分 类 号：TQ153.2[化学工程—电化学工业]