Heck偶联反应在有机单分子膜上的应用  

Heck coupling reaction performed on the organic monolayer

作　　者：何金梅[1] 屈孟男[1] 

机构地区：[1]西安科技大学化学与化工学院,西安710054

出　　处：《兰州大学学报（自然科学版）》2012年第4期127-130,共4页Journal of Lanzhou University(Natural Sciences)

基　　金：国家自然科学基金项目(21003099;21102113);陕西省自然科学基金项目(2010JQ2009)

摘　　要：利用Heck偶联反应成功地改变了自组装单分子有机薄膜的化学结构以及末端基团,薄膜末端的碘苯基团与对卤苯乙烯在标准的Heck反应条件下成功发生了偶联反应.这些薄膜经过了接触角、膜厚以及X射线光电子能谱的详细表征.这种表面修饰的方法有效地改变有机薄膜的表面化学.To modify the surface chemistry and the structure of monolayers, Heck coupling reaction was per- formed on the iodophenyl-terminated organic monolayer, which was prepared by thermally induced hydrosily- lation on hydrogen-terminated silicon （111） surfaces. The iodophenyl groups on the film surfaces reacted with 1-fluoro-4-vinylbenzene or 1-chloro-4-vinylbenzene under the standard Heck reaction conditions for attaching conjugated molecules via the formation of C-C bonds. The films were characterized by ellipsometry, contact- angle goniometry, and X-ray photoelectron spectroscopy （XPS）. It is expected that this surface coupling reaction will provide a new method for modifying the surface chemistry and structure of monolayers.

关 键 词：表面反应 HECK偶联反应 X射线光电子能谱 

分 类 号：O647[理学—物理化学]