织构单晶硅表面上银纳米颗粒的制备及其反射性质研究  

Formation and Reflection Properties of Ag Nanoparticles on the Textured c-Si Surface

作　　者：周丽丽[1] 马忠权[1] 杜汇伟[1] 丁虎[1] 石建伟[1] 杨洁[1] 

机构地区：[1]上海大学物理系索朗光伏材料与器件联合实验室,上海200444

出　　处：《光电子技术》2012年第3期150-154,199,共6页Optoelectronic Technology

摘　　要：为减少光反射损失,通过热蒸发在织构单晶硅(经含有碱液和添加剂的特殊溶液80°C腐蚀30min而成)表面上沉积了一定厚度的银膜后经一定温度(0～500°C)退火形成银纳米颗粒。SEM下观察到,银纳米颗粒的大小和形状与退火温度有很大关系。银纳米颗粒表现出的等离激元性质对反射谱有影响。实验分析得到,Ag沉积质量是0.003 8g,400°C N2退火20min时样品的反射率和反射率降低(REF<1)的波段达到最佳匹配。另外,金字塔上银纳米颗粒的均匀性与沉积的厚度有关。Ag nanoparticles（NPs） has been fabricated by thermodynamic processing of silver film,which is annealed with the nanoparticles formed on the textured Si surface,which was etched in a peculiar kind of solution of alkali and additive agents（80℃,30 min）,in order to manage the reflective light.The size and shape effects with different Ag NPs were obviously dependent on the annealing temperature variations ranging from 0 to 500℃ by SEM analysis.The plasmonic trapping of light associated with Ag NPs has an effect on reflectance spectrum.Based on analysis,the sample with 0.003 8 g Ag annealed at 400℃ in N2 for 20 min is the best one due to the optimal match of the reflectivity and the wavelengths corresponding to REF〈1.Further more,the homogeneity of Ag NPs on the pyramids is relative to the thickness of the deposition.

关 键 词：热蒸发 织构单晶硅 银纳米颗粒 等离激元 反射增强因子 

分 类 号：O485[理学—固体物理]