等离子体中充入工作气体抑制电子逃逸行为分析  

Investigation of the suppression of runaway electrons by puffing working gas in plasmas

作　　者：竹锦霞[1] 

机构地区：[1]四川文理学院物理与工程技术系,达州635000

出　　处：《原子与分子物理学报》2012年第5期863-866,共4页Journal of Atomic and Molecular Physics

基　　金：云南省教育厅科学研究基金项目(09J0025)

摘　　要：利用NaI闪烁体探测器组成的伽马射线探测系统和BF3 正比计数管、3He正比计数管和ZnS闪烁体探测器组成的中子探测系统，研究了欧姆放电平稳阶段充入工作气体后对逃逸电子产生过程的影响。实验结果表明：在欧姆放电平稳阶段充入工作气体严重影响了逃逸电子行为，充入的工作气体能有效抑制逃逸电子的产生。In terms of NaI scintillation detector consisting of gamma-ray detection system and BF3 proportional counter consisting of neutron detection system, the behavior of runaway electrons has been studied after puffing working gas during the current flat-top phase of ohmic discharge. The results show that during the current flat-top phase of ohmic discharge, the puffing working gas has seriously affected the behavior of runaway electrons. This method can effectively suppress the generation of runaway electrons.

关 键 词：逃逸电子 工作气体 抑制 

分 类 号：O53[理学—等离子体物理]