三价铬电镀工艺参数对其电流效率、镀层形貌和结合力的影响  

Effect of Trivalent Chromium Electroplating Parameters on Current Efficiency as well as Morphology and Adhesion to substrate of Chromium Coating

作　　者：邓艳[1] 卢建树[1] 

机构地区：[1]浙江工业大学材料化学实验室,浙江杭州310014

出　　处：《材料保护》2012年第10期42-44,1,共3页Materials Protection

摘　　要：为了替代六价铬装饰性镀铬工艺,减少六价铬对环境的污染,开发了一种硫酸盐三价铬电镀液及镀制工艺。研究了电流效率与镀液温度、pH值的关系,用扫描电子显微镜观察了镀层的显微形貌,测试了镀层与基体的结合力。结果表明,用此电镀液和合适的工艺可以镀得表面白亮、结晶平整、缺陷少的铬镀层。镀层由玉米粒状的铬颗粒堆积而成,与基体结合力强,能够用作装饰性镀铬。A trivalent chromium electroplating process was established so as to replace hexavalent chromium electroplating for decoration and reduce pollution of hexavalent Cr to environment.The relationship between the current efficiency and the bath temperature and pH value was studied.The morphology of as-plated Cr coating was observed with a scanning electron microscope,and the adhesion of as-plated Cr coating to substrate was determined by scratch test.Results indicate that the established trivalent Cr electroplating process can be adopted to prepare smooth and compact Cr coating with few defects.As-plated Cr coating consists of corn-kernel-like fine Cr grains and has good adhesion to substrate,showing promising application as a decorative coating.

关 键 词：三价铬电镀 电流效率 显微形貌 结合力 

分 类 号：TQ153.1[化学工程—电化学工业]