TA2工业纯Ti微弧氧化陶瓷膜生长规律及电容效应  

Growth rules and capacitor effect of pure titanium TA2 ceramic coating in microarc oxidation

作　　者：王宏元[1,2] 朱瑞富[1,2] 王志刚[3] 吕宇鹏[1,2] 肖桂勇[1,2] 朱先俊[1,2] 

机构地区：[1]山东大学材料液固结构演变与加工教育部重点实验室,山东济南250061 [2]山东大学材料科学与工程学院,山东济南250061 [3]山东建筑大学材料科学与工程学院,山东济南250101

出　　处：《功能材料》2012年第20期2763-2766,共4页Journal of Functional Materials

基　　金：山东省自然科学基金资助项目(ZR2009FM019)

摘　　要：对TA2工业纯Ti微弧氧化陶瓷膜的生长规律进行了实验研究,分析了陶瓷膜表面形貌、厚度、相结构等不同生长阶段的实验现象及结果。模拟微弧氧化工艺反应过程,运用多种理论建立并分析了氧化陶瓷膜生长模型及等效电路。模型及电路分析结果证明,陶瓷膜在形成时呈现先离散分布后连接成片的生长特点,成膜后TiO2陶瓷膜具有交流耦合电容效应。模型及等效电路分析与实验结果是吻合的,为改善TA2工业纯Ti微弧氧化工艺并提高陶瓷膜性能提供了实验与理论基础。Experiments on the rules of ceramic coating growth were conducted in the process of pure titaniumTA2 microarc oxidation （MAO）. The surface morphology, thickness and phase component in different stages were also analysed. Based on oxidation process and dielectric theories, theoretical model and equivalent circuit were established. The analysis results show that the ceramic coating distributes in fragmentation firstly and then in connection, and the completed TiO2 ceramic coating has alternating current （AC） coupling capacitor effect. All the analysis agrees with the experimental results, and it can provide a theoretical and experimental base for improving the performance of coatings as well as MAO technologies.

关 键 词：工业纯Ti 微弧氧化 陶瓷膜 生长规律 电容效应 

分 类 号：TG174[金属学及工艺—金属表面处理]