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作 者:岳永德[1] 陶庆会[1] 汤锋[1] 花日茂[1] 李学德[1]
出 处:《安徽农业大学学报》2000年第2期106-107,共2页Journal of Anhui Agricultural University
基 金:国家自然科学基金
摘 要:以高压汞灯和太阳光为光源 ,研究 S1 、 S2 等 1 0种表面活性剂在玻片表面和水溶液中对甲基对硫磷光解的影响。结果表明 :在玻片表面 ,甲基对硫磷在高压汞灯和太阳光下的光解半衰期分别为 4 .83 h和 5.0 6h。表面活性剂对甲基对硫磷光解有显著的敏化或猝灭作用。S1 、β-C、OP、 0 2 0 1、JFC和 2 2 0 1分别促进甲基对硫磷的表面光解 1 .3 2~ 3 .3 5倍 ,而 T和 S2 则延缓其光解 1 .59和 2 .0 4倍。甲基对硫磷在高压汞灯和太阳光下水溶液中的光解半衰期分别为 3 .96h和 3 1 .0 8h,表现光敏作用的表面活性剂有 S1 、T和 885,而 S2 、TX-8对甲基对硫磷在水溶液中的光解在两种光源下则表现相反的作用。The effects of 10 kinds of surfactants on the photodegradation of methyl parathion were studied under high pressure mercury lamp and sunlight It was found that six surfactants, namely S 1,β C, OP, 0201, JFC and 2201 accelerated the photodegradation of methyl parathion, but T and S 2 showed the photoquench effects on glass surface under both light sources In water,the effects of the surfactants on photolysis of methyl parathion were more intensive under high pressure mercury lamp than under sunlight because of short wavelength light below 300 nm unfiltered by quarz reaction tube Significant photosensitizing effects were observed for S 1, T and 885 under HPML, but contrary effects were showed for S 2 and TX 8 under two light sources The mechanism for the photo effects of the surfactants was explained with the change of absorption spectrum of reaction system
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