72.5kV真空灭弧室电位和电场分布研究  被引量:16

Potential and Electric Field Distributions of 72.5 kV Vacuum Interrupter

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作  者:邱志斌[1] 黄道春[1] 阮江军[1] 

机构地区:[1]武汉大学电气工程学院,武汉430072

出  处:《高压电器》2012年第11期36-42,共7页High Voltage Apparatus

基  金:国家科技支撑计划项目(2009BAA19B05);国家电网公司重大科技项目(SG0846)~~

摘  要:为分析72.5 kV真空灭弧室的电位分布和电场分布及其影响因素,建立了其轴对称有限元分析模型,计算了其电位分布和电场分布,研究了真空击穿的面积效应,并分析了主屏蔽罩的结构尺寸及多个屏蔽罩对真空灭弧室内部电场分布的影响。结果表明:真空灭弧室动静触头之间、触头和屏蔽罩之间的电位变化比较显著,灭弧室内部电场分布不均匀;随着触头间隙距离、触头半径及倒角部分曲率半径的增大,触头表面有效面积将增大,而灭弧室内部最大场强将有所减小;增大主屏蔽罩的半径和长度,可以使屏蔽罩两端的场强有所减小,在真空灭弧室内安装多个屏蔽罩,可以改善内部电场分布。计算结果可为高电压等级真空灭弧室的优化设计提供参考。An axisymmetric finite element model of 72.5 kV vacuum interrupter is established to analyze the potential and electric field distributions as well as the factors influencing the distributions. Subsequently, the potential and electric field distributions are calculated, the area effect of vacuum breakdown is investigate, and the effects of main shield's structure and size and multiple shields on the electric field distribution inside the vacuum interrupter are analyzed. The results indicate that: The potentials between moving and stationary contacts and between contacts and shield change obviously, and the electric field distribution inside the interrupter is non-uniform; With the increase in contact gap distance, contact radiuJs, and curvature radius of contact chamfer, the active area on contact surface enlarges length o , but the maximum electric field strength inside the interrupter reduces; The increase in radius and f the main shield leads to decrease in electric field strength at both ends of the shield, and the internal electric field distribution gets more uniform if there are multiple shields in the vacuum interrupter This study may provide a reference for optimization design of high voltage vacuum interrupter.

关 键 词:真空灭弧室 电位分布 电场分布 面积效应 屏蔽罩 

分 类 号:TM561.5[电气工程—电器]

 

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