N^+离子注入对辣椒生长特性的影响  

Research on Growth Characteristics of Pepper after N^+ Implantation

作　　者：蔡长龙[1] 梁海锋[1] 马睿[1] 严一心[1] 

机构地区：[1]西安工业大学离子束生物工程与生物多样性研究中心,710032

出　　处：《长江蔬菜》2012年第20期28-31,共4页Journal of Changjiang Vegetables

基　　金：陕西省教育厅专项科研计划项目(12JK0838);陕西省科学技术研究发展计划项目(2012K08-05)

摘　　要：采用生物改性离子注入设备对辣椒干种子进行了N+离子注入,研究了N+离子注入工艺参数及其对辣椒种子出苗时间、生长特性的影响。试验结果表明,离子注入能量和注入剂量是影响辣椒种子出苗时间的重要工艺参数,并且对辣椒后期的生长特性如茎高、叶片大小及外形有重要影响,另外,研究获得了使辣椒产生变异的基本工艺参数及其变化规律。In this paper, we implanted N＋ into the dry seeds of pepper using the biological modified ion implantation equipment, and studied the suitable ion implantation process parameters and their effects on the emergence time and growth characteristics of dry pepper seeds. The results showed that, the ion implantation energy and dose were the important technical parameters influencing the germination time, and had important effects on the later growth characteristics, such as the stem height, leaf size and leave shape. We obtained the basic process parameters and change rules to get pepper mutants after N＋ was implantated.

关 键 词：N+离子注入 辣椒 出苗时间 生长特性 

分 类 号：S641.3[农业科学—蔬菜学]