脉冲准分子激光大面积扫描沉积V_2O_5光电薄膜及光谱分析  

Spectroscopic Characterization and Deposition of Large Area V_2O_5 Optical Thin Films by Laser Scanning Ablation

作　　者：方国家[1] 刘祖黎[1] 王又青[1] 夏清华[2] 姚凯伦 

机构地区：[1]华中科技大学激光技术国家重点实验室 [2]襄樊学院物理系信息功能材料研究室,湖北襄樊441053

出　　处：《红外技术》2000年第5期5-9,共5页Infrared Technology

基　　金：国家自然科学基金! (编号 :19775 0 16 );湖北省自然科学基金! (编号 :99J0 49)资助项目

摘　　要：采用脉冲准分子激光大面积扫描沉积技术 ,在透明导电玻璃 (ITO)及Si(1 1 1 )单晶基片上沉积了尺寸达 4× 4cm2 ,具有高c轴 (0 0 1 )取向生长的V2 O5薄膜。采用X射线衍射 (XRD)、拉曼光谱 (RS)、傅里叶红外光谱 (FT IR)对沉积及不同温度下退火处理的样品结构和光谱特性进行了研究。VO x thin films were succesfully synthesized . (111) using scanning laser ablation technique. The structural properties of VO x thin films s deposited and annealed in diffrent londitionwere analysed with X ray diffraction(XRD), Fourier Transform Infrared Spectrum (FT IR), Raman Spectrum (RS). The as deposited VO x thin film showed c axis orientation with polycrystalline orthorhombic structure and those annealed over 300℃ above showed higher c axis oriented growth.

关 键 词：V2O5薄膜 脉冲准分子激光 大面积扫描沉积 

分 类 号：TN304.055[电子电信—物理电子学] TN304.21