降膜流动行为的数值模拟研究  

Numerical Simulation on Falling Film Behavior

作　　者：于意奇[1] 杨燕华[1] 程旭[1] 顾汉洋[1] 

机构地区：[1]上海交通大学核科学与工程学院,上海200240

出　　处：《原子能科学技术》2012年第10期1207-1211,共5页Atomic Energy Science and Technology

摘　　要：本文对降膜的流动行为进行了二维和三维的数值模拟。分析了不同雷诺数下降膜的液膜厚度、液膜速度、壁面剪应力。模拟结果与实验值以及理论模型的推导值进行了比较,吻合程度良好。模拟研究表明:三维模拟可再现降膜的表面波动,而二维模拟无法预测这种波动。三维数值模拟得到的瞬态结果也显示了表面波动对液膜速度和壁面剪应力的影响。Both 2 and 3 dimensional numerical simulations on falling film behaviour were carried out.The thickness and velocity of water film were studied under different Reynolds numbers.The results agree well with experimental and theoretical data.The simulation results show that the surface wave on falling film can only be reproduced by three-dimensional simulations.The results reveal the influence of the surface wave on film velocity and wall shear stress.

关 键 词：降膜 液膜厚度 波动 

分 类 号：TK124[动力工程及工程热物理—工程热物理]