低温镀铁层沉积速率的研究  

A Research on Deposition Rate of Low Temperature Iron Coating

作　　者：杨森[1] 

机构地区：[1]辽宁工程技术大学矿业技术学院,辽宁葫芦岛125100

出　　处：《电镀与环保》2012年第6期16-17,共2页Electroplating & Pollution Control

摘　　要：研究了pH值、温度、电流密度以及主盐的质量浓度对低温镀铁层沉积速率的影响。结果表明:当pH值为1.0时,镀层的沉积速率最大;随着温度的升高,电流密度的增加或者镀液中主盐的质量浓度的增加,镀层的沉积速率增大。The effects of pH value, temperature, current density and main salt mass concentration on the deposition rate of low temperature iron coating was studied. The results show that the deposition rate is the highest when pH value is 1. 0; the deposition rate will go up with the increasing of temperature, current density or mass concentration of main salt in the plating solution.

关 键 词：镀铁层 PH值 温度 电流密度 主盐 沉积速率 

分 类 号：TQ153[化学工程—电化学工业]