材料表面处理用强流电子回旋共振离子源  

Electron cyclotron resonance ion source for material surface treatment

作　　者：明建川[1] 郭之虞[1] 彭士香[1] 

机构地区：[1]北京大学核物理与核技术国家重点实验室,北京100871

出　　处：《强激光与粒子束》2012年第12期2911-2914,共4页High Power Laser and Particle Beams

摘　　要：介绍一台2.45GHz永磁强流电子回旋共振离子源,其外径160mm,高90mm,放电室直径70mm,高50mm。微波馈入采用介质耦合方式,微波窗由一块50mm×10mm柱形BN和两块30mm×10mm的柱形陶瓷构成。离子源工作在脉冲模式下,采用三电极引出系统,最高引出电压达到100kV,在微波输入功率300W、进气量0.4mL/min时,可引出峰值超过30mA的氮离子束,在距离离子源引出孔1200mm位置处的束流均匀区直径大于200mm。A 2.45 GHz electron cyclotron resonance ion source with permanent magnets has been developed.Its outline dimension is 160 mm in diameter and 90 mm in height,the discharge chamber＇s dimension is 70 mm in diameter and 50 mm in hehight.The microwave window is made of a 50 mm×10 mm BN disk and two 30 mm×10 mm ceramic disks.This ion source adopts a three-electrode extraction system and works in the pulsed mode.When the microwave input power is 300 W,the air inflow is 0.4 mL/min,a more than 30 mA peak current of the nitrogen beam can be extracted from a 5 mm emission aperture at 100 kV extraction voltage.The diameter of the beam uniform area on the working plane is more than 200 mm.

关 键 词：电子回旋共振离子源 微波窗 表面处理 引出系统 

分 类 号：TL503.3[核科学技术—核技术及应用]