化学溶液沉积法制备Pb_(0.5)Ba_(0.5)TiO_3薄膜的结构及电学性能研究  

Structural and Electrical Properties of Pb_(0.5)Ba_(0.5)TiO_3 Thin Film Using a Chemical Solution Deposition Method

作　　者：陈如麒[1] 朱贵文[2] 刘为方[3,4] 

机构地区：[1]华南农业大学公共基础课实验教学中心,广东广州510642 [2]广东药学院基础学院,广东广州510006 [3]韩华新能源(启东)有限公司,江苏南通226200 [4]中山大学物理科学与工程技术学院∥光电材料与技术国家重点实验室,广东广州51027

出　　处：《中山大学学报（自然科学版）》2012年第6期78-81,共4页Acta Scientiarum Naturalium Universitatis Sunyatseni

基　　金：广东省高校优秀青年创新人才培育资助项目(LYM10036);华南农业大学校长科学基金资助项目(6900-k09183)

摘　　要：采用化学溶液沉积法在Pt/TiO2/SiO2/Si基片上制备钛酸铅钡Pb0.5Ba0.5TiO3(PBT)薄膜。薄膜呈纯钙钛矿结构,无杂相生成。此外,薄膜表面光滑致密、没有微裂痕.薄膜得到的晶粒尺寸较小,约为17 nm。在700℃1 h退火的薄膜有良好的电学特性,在1 kHz频率下测量得到的介电常数、损耗因子分别约为265和5%;此外,在500 kV/cm电场驱动下,薄膜得到的剩余极化(2Pr)约为16μC/cm2,矫顽电场(Ec)约为110 kV/cm。这些结果表明,PBT固溶体薄膜有望成为铁电器件的候选材料。Pb0. 5Ba0. 5TIO3（PBT） thin films were prepared on Pt/TiO2/SiO2/Si substrates by using a chemical solution deposition method. The thin films were phase-pure with perovskite structure, no secondary phase was observed. Meanwhile, they were smooth, density and crack-free with small grain size of about 17 nm. Good electrical properties were observed in the films annealed at 700 ℃ for 1 h. The dielectric constant and the dissipation factor （ at 1 kHz） were 265 and 5 %, respectively. Driven by a electric field of 500 kV/cm, PBT showed 2 Pr of and Ec of 110 kV/cm. These suggested that PBT had potentials in applications of ferroelectric devices.

关 键 词：钛酸铅钡 PBT 介电 铁电 化学溶液沉积法 

分 类 号：O484[理学—固体物理]