机构地区:[1]State Key Lab.of Fundamental Science on Wide Band-Gap Semiconductor Technology,School of Microelectronics,Xidian University,Xi'an 710071,China [2]School of Materials Science and Engineering of Xi'an ShiYou University,Xi'an 710065,China
出 处:《Science China(Physics,Mechanics & Astronomy)》2012年第12期2383-2388,共6页中国科学:物理学、力学、天文学(英文版)
基 金:supported by the National Key Science and Technology Special Project,China(Grant No.2008ZX01002-002);the Major Program and State Key Program of the National Natural Science Foundation of China(Grant Nos.60890191 and 60736033);the Fundamental Research Funds for the Central Universities,China(Grant No. JY10000904009)
摘 要:In this study,the thick AlGaN epilayers have been grown on the c-plane sapphire substrate and the free-standing GaN substrate using low-temperature AlN nucleation layers by low-pressure metal-organic chemical vapor deposition(LPMOCVD).High resolution X-ray diffraction(HRXRD),atom force microscopy(AFM),scanning electron microscopy(SEM),photoluminescence(PL) and Raman scattering measurements have been employed to study the crystal quality,threading dislocation density,surface morphology,optical properties and phonon properties of thick AlGaN epifilms.The results indicate that AlGaN epifilms crystal quality can be improved greatly when grown on the free-standing GaN substrate.We calculated the threading dislocation density and found that thick AlGaN epifilm grown on the free-standing GaN substrate is much lower in total threading dislocation density than that grown on the sapphire substrate,although the surface morphology is rougher than that of sapphire substrate.In this study,the thick AlGaN epilayers have been grown on the c-plane sapphire substrate and the free-standing GaN substrate using low-temperature AlN nucleation layers by low-pressure metal-organic chemical vapor deposition(LPMOCVD).High resolution X-ray diffraction(HRXRD),atom force microscopy(AFM),scanning electron microscopy(SEM),photoluminescence(PL) and Raman scattering measurements have been employed to study the crystal quality,threading dislocation density,surface morphology,optical properties and phonon properties of thick AlGaN epifilms.The results indicate that AlGaN epifilms crystal quality can be improved greatly when grown on the free-standing GaN substrate.We calculated the threading dislocation density and found that thick AlGaN epifilm grown on the free-standing GaN substrate is much lower in total threading dislocation density than that grown on the sapphire substrate,although the surface morphology is rougher than that of sapphire substrate.
关 键 词:metal-organic chemical vapor deposition crystal quality surface morphology AlN nucleation layer
分 类 号:TN304.23[电子电信—物理电子学] O484.1[理学—固体物理]
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