多面体低聚倍半硅氧烷的研究进展  

Progress on Polyhedral Oligomeric Silsesquioxanes

作　　者：李镇江[1,2,3] 梁玮[1,2,3] 张林[2,3] 

机构地区：[1]西南科技大学材料科学与工程学院,四川绵阳621010 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900 [3]西南科技大学中国工程物理研究院激光聚变研究中心极端条件物质特性联合实验室,四川绵阳621010

出　　处：《有机硅材料》2012年第6期416-421,共6页Silicone Material

基　　金：中物院双百人才基金资助课题(20088074)

摘　　要：介绍了多面体低聚倍半硅氧烷(POSS)的基本特性以及常用的5种制备方法。指出了POSS在多孔材料、高性能高分子材料、光固化树脂、电子材料以及航空与空间等领域的应用情况。对POSS在发展过程中存在的一些问题进行了分析并展望了其今后的发展趋势。The basic characteristics of POSS and 5 kinds of common-used synthesis methods for POSS monomers were introduced. The applications of POSS-based materials used as porous materials, high perform- ance polymer materials, light-cured resin, electronic materials and its usage in aviation and space were sum- marized. Some existing problems in the process of the were also forecasted. development of POSS were analyzed and the prospects

关 键 词：多面体 低聚倍半硅氧烷 POSS基材料 

分 类 号：O634.41[理学—高分子化学]