贴膜条件下飞秒激光诱导硅基表面锥状微结构  

Femtosecond laser induced silicon surface cone microstructures by covering transparent films

作　　者：李保家[1] 周明[1] 张伟[1] 

机构地区：[1]江苏大学材料科学与工程学院,光子制造科学技术中心江苏省重点实验室,镇江212013

出　　处：《物理学报》2012年第23期490-497,共8页Acta Physica Sinica

基　　金：江苏省普通高校博士研究生科研创新计划(批准号:CX08B_053Z);国家重点基础研究发展计划(批准号:2011CB013004);国家自然科学基金(批准号:50975129);江苏高校优势学科建设工程项目资助的课题~~

摘　　要：利用波长为800 nm的飞秒脉冲激光,对表面贴有聚对苯二甲酸乙二醇酯透明膜的单晶硅片进行扫描,研究了不同激光制备参数对微结构形成的影响.结果表明,锥状微结构是否形成取决于激光能量密度,能量密度太小时不能形成锥状结构,能量密度太大时易破坏锥状突起;而激光扫描速度可直接影响锥状微结构的质量,扫描速度太小时也易破坏锥状结构突起,扫描速度太大时,由于作用深度太浅使得锥状结构轮廓不分明.在此基础上对实验参数进行优化,得到了较理想的锥状微结构.最后通过分析指出,贴膜条件下锥状微结构的形成是由激光烧蚀作用和氧化作用共同引起的,且激光烧蚀作用占主导.We investigate the effect of preparation parameters on the formation of microstructures created on a single crystal silicon wafer covered with a polyethylene terephthalate （PET） transparent film by femtosecond pulse laser with a central wavelength of 800 nm. The results reveal that formation of the cone microstructures depends on laser fluence, and the cone microstructures cannot be created by lower laser fluence or can be destroyed by higher laser fluence. The laser scanning speed can directly affect the quality of the cone microstructures, and lower speed will destroy the cone, while higher speed will create indistinct cone microstructures each with smaller depth. Some idealized structures are obtained by optimizing the experimental parameters. Finally, we find that the cone microstructures on silicon wafer covered with a film are caused by both laser ablation and oxidation, and laser ablation plays a major role.

关 键 词：飞秒激光 硅 锥状微结构 聚对苯二甲酸乙二醇酯透明膜 

分 类 号：TN249[电子电信—物理电子学]